Sputtering (DC/RF)

Three source magnetron sputtering system capable of producing multilayer films without ever having to break UHV.

RF sputtering (13.56 MHz) is available for depositing highly insulating materials.
Substrate rotation ensures high deposition uniformity.

Typical substrate sizes are 2”, 3”, and 4” diameters, however custom sizes and shapes can also be accommodated.

Please inquire about substrate heating/cooling.